Comsol Error 6109
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Installshield -4340: Internal Build Error
pageEmailLinkedInFacebookTwitterDeliciousDiggStumbleuponMore services... radiation boundary condition on comsol4.0 Topics: no topics Thread index | Previous thread | Next thread fatal error internal build error | Start a new discussion RSS feed | Turn on email notifications | 1 Reply Last post: August 27, 2010 6:39am UTC SERAP KARAGOL isexp : error : -4340: internal build error August 26, 2010 9:09pm UTC radiation boundary condition on comsol4.0 Hi I am simulating radiation heat transfer with comsol 4.0 which I start using today. Before I was using Comsol 3.3. I am simulating same model which I modeled on 3.3 and it did not give me any error. When I used same model ( I modeled from scratch
Isexp : Fatal Error -4340: Internal Build Error
in 4.0) with all same properties I am getting following error. " Radiation error: exactly one adjacent domain must be opaque. " I am not clear what cause this error.. Please advise thanks Reply | Reply with Quote | Send private message | Report Abuse Ivar Kjelberg August 27, 2010 6:39am UTC in response to SERAP KARAGOL Re: radiation boundary condition on comsol4.0 Hi I havent had time to play alot with the radiatio physics in V4, but I noticed that there are many boundary condition settings, so I suspect that you have missed one (do none of your surfaces absorb ?) could this be it ? -- Good luck Ivar Reply | Reply with Quote | Send private message | Report Abuse Rules and guidelines Contact Sales Try Hands-On Product Information Products Specification Chart CAD Specification Chart COMSOL Server FAQ (PDF) License Options System Requirements COMSOL Software License Agreement (PDF) Release Highlights 5.2a Release History Examples and Galleries Video Gallery User Story Gallery Application Gallery Technical Papers and Presentations Resources COM
a single msi image using project assistant. ISDEV : warning -6245: One or more of the project's components contain .NET properties that require the .NET Framework. It is recommended that the release include the .NET http://www.comsol.com/community/forums/general/thread/8909/ Framework. ISDEV : fatal error -6109: Internal build error 08-30-2007, 02:05 AM kaliyamoorthy Hi Me too getting the same error. Kindly give me the solution.. 08-30-2007, 05:24 AM Ash008 Go to the the proprties of the component and change http://community.installshield.com/printthread.php?t=172605 .net scan at build to none. this will solev ur problem 08-30-2007, 05:39 AM kaliyamoorthy Thanks Thank you for your help. I am using Instalshield2008 . Still getting the following errors 1.6109 - Internal Build error 2.6245 - One or more project components contains .net properties that require the .net frmaework. 08-30-2007, 05:57 AM Ash008 Have you made the changes for all the components. Show 40 post(s) from this thread on one page Page 1 of 2 12 Last Jump to page: All times are GMT -5. The time now is 03:01 AM. Powered by vBulletin Version 4.2.2 Copyright © 2016 vBulletin Solutions, Inc. All rights reserved. © 2016 Flexera Software LLC. All rights reserved.
feedback return to old SpringerLink Journal of Solid State ElectrochemistryDecember 2013, Volume 17, Issue 12, pp 3083–3091Electrochemistry of TEMPO: an assessment http://link.springer.com/article/10.1007/s10008-013-2191-3 of the water diffusion constant in the aqueous liquid/vapor interfacial regionAuthorsAuthors http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4440408/ and affiliationsEric D. CarlsonMarcin MajdaEmail authorOriginal PaperFirst Online: 10 August 2013Received: 05 June 2013Revised: 12 July 2013Accepted: 15 July 2013DOI: 10.1007/s10008-013-2191-3Cite this article as: Carlson, E.D. & Majda, M. J Solid State Electrochem (2013) 17: 3083. doi:10.1007/s10008-013-2191-3 1 Citations 191 Views AbstractTEMPO, 2,2,6,6-tetramethylpiperidnyl-1-oxy, is a weak surfactant exhibiting internal build a reversible redox activity: a one-electron oxidation to its oxonium cation. In the course of our earlier work (ref. Wu et al. in J Am Chem Soc 127:4490–4496, 2005; Glandut et al. in J Phys Chem B 110:6101–6109, 2006; Glandut et al. in Langmuir 22:10697–10704, 2006), we developed a full understanding of TEMPO’s electrochemistry at line microband internal build error electrodes. In these experiments TEMPO diffuses to the line electrode residing in the plane of the air/water interface in two coupled media, bulk aqueous phase with D = 7.7 × 10−6 cm2/s and along the 2D air/water interface with at least an order of magnitude greater surface diffusion constant, Dsurf. The magnitude of the TEMPO oxidation current depends jointly on Dsurf and on the rate of surface partitioning expressed by the desorption rate constant, kdes. The population of TEMPO partitioned to the air/water interface is largely unsolvated and couples to the aqueous solution by hydrogen bonding to predominately one water molecule. Our experimental methodology allows us to simultaneously determine Dsurf and kdes by recording TEMPO voltammetric curves with line microband and barrier microband electrodes. In this report, we present a new methodology of producing and characterizing barrier microband electrodes using vapor-deposited SiO and introduce additional measures such as aspiration of the air/water interface designed to substantially reduce if not eliminate negative error due to surface impurities. These investigations generated a more accurate value
Health Search databasePMCAll DatabasesAssemblyBioProjectBioSampleBioSystemsBooksClinVarCloneConserved DomainsdbGaPdbVarESTGeneGenomeGEO DataSetsGEO ProfilesGSSGTRHomoloGeneMedGenMeSHNCBI Web SiteNLM CatalogNucleotideOMIMPMCPopSetProbeProteinProtein ClustersPubChem BioAssayPubChem CompoundPubChem SubstancePubMedPubMed HealthSNPSRAStructureTaxonomyToolKitToolKitAllToolKitBookToolKitBookghUniGeneSearch termSearch Advanced Journal list Help Journal ListACS AuthorChoicePMC4440408 Environmental Science & Technology Environ Sci Technol. 2015 May 19; 49(10): 6109–6116. Published online 2015 Apr 15. doi: 10.1021/acs.est.5b00134PMCID: PMC4440408Numerical Evaluation of Lateral Diffusion Inside Diffusive Gradients in Thin Films SamplersJakob Santner,*† Andreas Kreuzeder,†‡ Andrea Schnepf,§ and Walter W. Wenzel††University of Natural Resources and Life Sciences, Vienna, Department of Forest and Soil Sciences, Institute of Soil Research, Konrad-Lorenz-Strasse 24, 3430 Tulln an der Donau, Austria‡Land Salzburg, Abteilung 5-Natur-und Umweltschutz, Gewerbe, Michael-Pacher-Straße 36, 5020 Salzburg, Austria§Forschungszentrum Jülich, IBG-3, Wilhelm-Johnen-Straße, 52425 Jülich, Germany*E-mail: ta.ca.ukob@rentnas.bokaj.Author information ► Article notes ► Copyright and License information ►Received 2015 Jan 9; Revised 2015 Apr 10; Accepted 2015 Apr 15.Copyright © 2015 American Chemical SocietyThis is an open access article published under a Creative Commons Attribution (CC-BY) License, which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.AbstractUsing numerical simulation of diffusion inside diffusive gradients in thin films (DGT) samplers, we show that the effect of lateral diffusion inside the sampler on the solute flux into the sampler is a nonlinear function of the diffusion layer thickness and the physical sampling window size. In contrast, earlier work concluded that this effect was constant irrespective of parameters of the sampler geometry. The flux increase caused by lateral diffusion inside the sampler was determined to be ∼8.8% for standard samplers, which is considerably lower than the previous estimate of ∼20%. Lateral diffusion is also propagated to the diffusive boundary layer (DBL), where it leads to a slightly stronger decrease in the mass uptake than suggested